추천 제품
Quality Level
분석
97%
양식
liquid
autoignition temp.
763 °F
expl. lim.
9.8 %
반응 적합성
core: aluminum
bp
200-206 °C/30 mmHg (lit.)
density
0.967 g/mL at 25 °C (lit.)
SMILES string
CCC(C)O[Al](OC(C)CC)OC(C)CC
InChI
1S/3C4H9O.Al/c3*1-3-4(2)5;/h3*4H,3H2,1-2H3;/q3*-1;+3
InChI key
WOZZOSDBXABUFO-UHFFFAOYSA-N
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일반 설명
Aluminum-tri-sec-butoxide is a metal organic chemical vapor deposition precursor and a chelating agent. It is widely used as a sol-gel precursor to deposit alumina thin films by atomic layer deposition method.
애플리케이션
Aluminum-tri-sec-butoxide can be used as a precursor :
- To prepare Al2O3-based quasi-solid electrolyte for Li metal anodes. This ensures long cycle lifetime and high constant current density.
- To synthesize nanospinel MgAl2O4 powder by a sol–gel method at low-temperature processing.
- To fabricate transparent superhydrophobic aluminum oxide thin films to prevent soiling of solar panels.
- To synthesize mesoporous alumina with large surface area to fabricate a functional interlayer for separator coating in a Li–S battery. It helps to suppress the shuttle effect and enhances cyclic stability andrateperformance.
특징 및 장점
- Suitable for thin film deposition
- Solubility in various solvents allows for the facile preparation of solution-based precursors
- High thermal stability
- Facilitates the anchoring of catalytic metal nanoparticles onto substrates
Has been utilized in making high-surface-area alumina using 2,4-pentanedione (Aldrich product P775-4) as a chelating agent.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Acute Tox. 3 Dermal - Acute Tox. 4 Oral - Flam. Liq. 3
Storage Class Code
3 - Flammable liquids
WGK
WGK 3
Flash Point (°F)
78.8 °F - closed cup
Flash Point (°C)
26 °C - closed cup
개인 보호 장비
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
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