408964
Cyclohexyl methacrylate
≥97%, contains ~60 ppm monomethyl ether hydroquinone as inhibitor
동의어(들):
Methacrylic acid cyclohexyl ester
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모든 사진(1)
About This Item
Linear Formula:
CH2=C(CH3)COOC6H11
CAS Number:
Molecular Weight:
168.23
Beilstein:
2045235
EC Number:
MDL number:
UNSPSC 코드:
12162002
PubChem Substance ID:
NACRES:
NA.23
추천 제품
Quality Level
분석
≥97%
양식
liquid
포함
~60 ppm monomethyl ether hydroquinone as inhibitor
refractive index
n20/D 1.458 (lit.)
bp
68-70 °C/4 mmHg (lit.)
density
0.964 g/mL at 25 °C (lit.)
SMILES string
CC(=C)C(=O)OC1CCCCC1
InChI
1S/C10H16O2/c1-8(2)10(11)12-9-6-4-3-5-7-9/h9H,1,3-7H2,2H3
InChI key
OIWOHHBRDFKZNC-UHFFFAOYSA-N
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일반 설명
Cyclohexyl methacrylate(CHMA) is an acrylate monomer with a high-refractive index, commonly used in ultraviolet (UV) curing processes due to its ability to rapidly polymerize under UV light exposure. UV-curable CHMA-based coatings, adhesives, and inks offer fast curing, excellent hardness, hydrophobicity, and high durability. It has good optical clarity, resulting in optical lenses with high transparency and minimal distortion. It can also be used as a crosslinking agent in copolymer systems for dental composites and tissue engineering to enhance the mechanical and thermal properties of the resulting materials.
애플리케이션
Cyclohexyl methacrylate can be used:
- As a monomer to prepare poly(cyclohexyl methacrylate) (PCHMA) thin films for high-performance luminescent solar concentrators(LSCs). These LSCs can be used to fabricate high-quantum yield photovoltaic solar cells.
- As a comonomer to prepare photo-patternable quantum dot-acrylate resins for fabricating light-emitting diodes with high color transparency.
- As a monomer to synthesizesuperhydrophobic silica nanoparticle surfaces for various applications such as anti-corrosionsurfaces, drag reduction, and energy conservation.
신호어
Warning
유해 및 위험 성명서
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2 - Skin Sens. 1 - STOT SE 3
표적 기관
Respiratory system
Storage Class Code
10 - Combustible liquids
WGK
WGK 1
Flash Point (°F)
181.4 °F
Flash Point (°C)
83 °C
개인 보호 장비
Eyeshields, Gloves, type ABEK (EN14387) respirator filter
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