553468

Tris(tert-butoxy)silanol

99.999%

• 동의어(들): TBS
• Linear Formula: ((CH₃)₃CO)₃SiOH
• CAS Number: 18166-43-3
• Molecular Weight: 264.43
• MDL number: MFCD00271024
• UNSPSC 코드: 12352103
• PubChem Substance ID: 24879332
• NACRES: NA.23

속성

• Quality Level: 100
• 분석: 99.999%
• 양식: solid
• bp: 205-210 °C (lit.)
• mp: 63-65 °C (lit.)
• SMILES string: CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C
• InChI: 1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3
• InChI key: HLDBBQREZCVBMA-UHFFFAOYSA-N

설명

일반 설명

Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.

애플리케이션

Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH₃)₂)₄) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.

안전성 정보

• Storage Class Code: 11 - Combustible Solids
• WGK: WGK 3
• Flash Point (°F): Not applicable
• Flash Point (°C): Not applicable
• 개인 보호 장비: Eyeshields, Gloves, type N95 (US)