900755

SLAP TA

95%

• 동의어(들): 3-(((Trimethylsilyl)methyl)thio)propan-1-amine
• 실험식(Hill 표기법): C₇H₁₉NSSi
• CAS Number: 2093935-86-3
• Molecular Weight: 177.38
• MDL number: MFCD31560650
• UNSPSC 코드: 12352103
• NACRES: NA.22

속성

• Quality Level: 100
• 분석: 95%
• 양식: liquid
• density: 0.90452
• 작용기: amine; thioether
• 저장 온도: 2-8°C
• SMILES string: [Si](CSCCCN)(C)(C)C
• InChI: 1S/C7H19NSSi/c1-10(2,3)7-9-6-4-5-8/h4-8H2,1-3H3
• InChI key: CNESDLLESCAVSR-UHFFFAOYSA-N

설명

애플리케이션

When used with aliphatic or aromatic aldehydes, this silicon amine protocol SLAP reagent enables the photomediated synthesis of thiomorpholines and thiazepanes. For photocatalytic cross-coupling with this SLAP Reagent, Ir[(ppy)₂dtbbpy]PF₆ (747769) is used with a recommended starting combination of Lewis acids Bi(OTf)₃ (633305) and Cu(OTf)₂ (283673) prior to subsequent substrate-specific optimization. This product was introduced in collaboration with the Bode Research Group and provides a tin-free alternative to SnAP (tin amine protocol) reagents and is well-suited for scale-up reactions.

기타 정보

• Technology Spotlight: SLAP Reagents for Piperazine Synthesis
• Silicon Amine Reagents for the Photocatalytic Synthesis of Piperazines from Aldehydes and Ketones
• Lewis Acid Induced Toggle from Ir(II) to Ir(IV) Pathways in Photocatalytic Reactions: Synthesis of Thiomorpholines and Thiazepanes from Aldehydes and SLAP Reagents.
• Continuous Flow Synthesis of Morpholines and Oxazepanes with Silicon Amine Protocol (SLAP) Reagents and Lewis Acid Facilitated Photoredox Catalysis

안전성 정보

• 픽토그램: GHS02
• 신호어: Warning
• 유해 및 위험 성명서: H226
• 예방조치 성명서: P210 - P370 + P378
• Hazard Classifications: Flam. Liq. 3
• Storage Class Code: 3 - Flammable liquids
• WGK: WGK 3
• Flash Point (°F): 75.0 °F
• Flash Point (°C): 23.89 °C