759562
Tris(dimethylamino)silane
packaged for use in deposition systems
동의어(들):
Tris(dimethylamino)silane, (Me2N)3SiH, N,N,N′,N′,N′′, N′′-Hexamethylsilanetriamine, Tris(dimethylamido)silane, N,N,N′,N′,N′′,N′′-Hexamethylsilanetriamine, TDMAS
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모든 사진(1)
About This Item
Linear Formula:
((CH3)2N)3SiH
CAS Number:
Molecular Weight:
161.32
EC Number:
MDL number:
UNSPSC 코드:
12352103
PubChem Substance ID:
NACRES:
NA.23
추천 제품
Quality Level
분석
≥99.9% (GC)
양식
liquid
bp
142 °C (lit.)
mp
−90 °C (lit.)
density
0.838 g/mL at 25 °C (lit.)
SMILES string
CN(C)[SiH](N(C)C)N(C)C
InChI
1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3
InChI key
TWVSWDVJBJKDAA-UHFFFAOYSA-N
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일반 설명
Tris(dimethylamino)silane is an organosilicon compound with high volatility and thermal stability, widely used as a vapor deposition precursor to fabricate silicon-containing thin films for various applications, including solar cells, fuel cell catalysts, and semiconductors. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range, thus making it a very good vapor deposition precursor.
애플리케이션
Tris(dimethylamino)silane can be used:
- As a silicon source for deposition of aluminum silicate on TiO2 anodes for dye-sensitized solar cells vis atomic layer deposition method.
- As a precursor to fabricate functionalized Si reinforced separators for Li-ion batteries.
신호어
Danger
유해 및 위험 성명서
Hazard Classifications
Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 2 - Skin Corr. 1B - Water-react 2
보충제 위험성
Storage Class Code
4.3 - Hazardous materials which set free flammable gases upon contact with water
WGK
WGK 3
Flash Point (°F)
16.0 - 32.0 °F - closed cup
Flash Point (°C)
-8.89 - 0.00 °C - closed cup
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